Maryland's Defense Patent Database

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Tracking carbon to silicon ratio <i>in situ </i>during silicon carbide growth

Patent image
NRL

A method of: supplying sources of carbon and silicon into a chemical vapor deposition chamber; collecting exhaust gases from the chamber; performing mass spectrometry on the exhaust gases; and correlating a partial pressure of a carbon species in the exhaust gases to a carbon:silicon ratio in the chamber.

Inventors: 
Vanmil, Brenda L.; Lew, Kok-keong; Myers-ward, Rachael L.; Eddy Jr., Charles R.; Gaskill, David Kurt
Patent Number: 
Technical domain: 
Materials and Coatings
FIle Date: 
2008-07-31
Grant Date: 
2013-12-10
Grant time: 
1,958 days
Grant time percentile rank: 
36
Claim count percentile rank: 
3
Citations percentile rank: 
1
'Cited by' percentile rank: 
1
Assignee: 
US NAVY