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Method for forming a device having nanopillar and cap structures

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CCDC ARL

A method for forming a device having nanopillar and cap structures on a substrate in which the substrate is first coated with a first resist having a first exposure dose to electron beam radiation, and that after coating the first resist with a second resist having a second exposure dose less than the first resist. Electron beam lithography is then used sequentially to form the nanopillars and cap structures or, alternatively, a template for the nanopillar and cap structures.

Inventors: 
Burke, Robert A.; Edelstein, Alan S.
Patent Number: 
Technical domain: 
Optics
FIle Date: 
2012-10-25
Grant Date: 
2014-12-09
Grant time: 
775 days
Grant time percentile rank: 
14
Claim count percentile rank: 
2
Citations percentile rank: 
1
'Cited by' percentile rank: 
1
Assignee: 
US ARMY