Maryland's Defense Patent Database

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Selective masking by photolithography (SMP) for making electrochemical measurements

Patent image
NRL

A method for isolating microstructural regions or features on a surface for electrochemical experimentation comprising polishing a metal sample, coating the metal sample with a photoresist, selecting a region of interest of the metal sample, exposing the region of interest with light energy, developing the exposed photoresist and creating a developed region.

Inventors: 
Martin, Farrel; Píqué, Alberto; Auyeung, Raymond C. Y.; Policastro, Steve
Patent Number: 
Technical domain: 
Optics
FIle Date: 
2012-09-14
Grant Date: 
2016-03-01
Grant time: 
1,264 days
Grant time percentile rank: 
23
Claim count percentile rank: 
4
Citations percentile rank: 
1
'Cited by' percentile rank: 
1
Assignee: 
US NAVY